Abstract
Using density functional calculations, we clarify the oxygen incorporation mechanism in vicinal m-GaN growth by metal-organic vapor-phase epitaxy. We first identify reconstructed structures of 5° off m-GaN toward the ±c directions. Next, we explore preferable sites for oxygen substitution near step edges. We find that oxygen prefers the lower nitrogen site of the step edge on the +c 5° off m-GaN substrate compared with that on the-c 5° off m-GaN substrate. This tendency agrees with recent experimental findings that the oxygen concentration in-c 5° off m-GaN epilayers is lower than that in +c 5° off m-GaN epilayers.
Original language | English |
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Article number | 055507 |
Journal | Applied Physics Express |
Volume | 13 |
Issue number | 5 |
DOIs | |
Publication status | Published - May 1 2020 |
All Science Journal Classification (ASJC) codes
- Engineering(all)
- Physics and Astronomy(all)