Chemical reaction of silicon clusters with nitric oxide by using FT-ICR mass spectrometer

Shuhei Inoue, Masamichi Kohno, Shigeo Maruyama

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Chemical reaction of small silicon cluster ions (Sin+:13, 15 ≤i ni ≤i 29) with nitric oxide was studied by using the FT-ICR (Fourier Transform Ion Cyclotron Resonance) mass spectrometer. Silicon clusters were generated by a pulsed laser-vaporization supersonic-expansion cluster beam source directly connected to the FT-ICR mass spectrometer. Fully thermalized and mass-selected clusters were reacted with NO in the ICR cell. The primary reaction was the exchange of a silicon atom with a nitrogen atom as Sin+ + NO → Sin-1N+ + SiO. Then, smaller clusters than Si23N+ (with exceptions for Si16N+ and Si20N+) fragmented to much smaller clusters. It was explained that in general smaller clusters could not survive with the exothermal reaction heat. On the other hand, the magic number clusters of Si16N+ and Si20N+ probably represented the geometrical special stability.

Original languageEnglish
Pages (from-to)1879-1885
Number of pages7
JournalNippon Kikai Gakkai Ronbunshu, B Hen/Transactions of the Japan Society of Mechanical Engineers, Part B
Issue number684
Publication statusPublished - Aug 2003
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Mechanical Engineering


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