Chemical degradation mechanism of model compound, CF3(CF 2)3O(CF2)2OCF2SO 3H, of PFSA polymer by attack of hydroxyl radical in PEMFCs

Takayoshi Ishimoto, Ryo Nagumo, Teppei Ogura, Takashi Ishihara, Boyeong Kim, Akira Miyamoto, Michihisa Koyama

    Research output: Contribution to journal › Article › peer-review

    26 Citations (Scopus)

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    Chemistry