TY - JOUR
T1 - Characterization of the YbBa2Cu3O(7-y) and YBa2Cu3O(7-y) thin superconducting films prepared by chemical solution deposition on MgO(001) substrate
AU - Ma, X. L.
AU - Yamagiwa, K.
AU - Shibata, J.
AU - Hirayama, T.
AU - Hirabayashi, I.
AU - Ikuhara, Y.
N1 - Funding Information:
This work was supported by the New Energy and Industrial Technology
PY - 1999
Y1 - 1999
N2 - Thin superconducting films of the YbBa2Cu3O(7-y) (Yb123) and YBa2Cu3O(7-y) (Y123), prepared by post-deposition annealing of the metal naphthenates gels spin-coated on MgO(001) substrate, have been characterized by cross-sectional high-resolution electron microscopy and X-ray diffraction. It was found that the c-axis Yb123 films were epitaxially grown on the MgO(001) substrate at the temperature range from 700°C to 775°C in a gas mixture containing Ar and O2 with the oxygen partial pressure of p(O2) = 10-4 atm. In contrast to the Yb123 films, it was found that Y123 films could be derived at a wider temperature range from 750°C to 950°C. Randomly oriented Y123 films were also grown on the MgO(001) substrate besides the majority of in-plane c-axis oriented growth.
AB - Thin superconducting films of the YbBa2Cu3O(7-y) (Yb123) and YBa2Cu3O(7-y) (Y123), prepared by post-deposition annealing of the metal naphthenates gels spin-coated on MgO(001) substrate, have been characterized by cross-sectional high-resolution electron microscopy and X-ray diffraction. It was found that the c-axis Yb123 films were epitaxially grown on the MgO(001) substrate at the temperature range from 700°C to 775°C in a gas mixture containing Ar and O2 with the oxygen partial pressure of p(O2) = 10-4 atm. In contrast to the Yb123 films, it was found that Y123 films could be derived at a wider temperature range from 750°C to 950°C. Randomly oriented Y123 films were also grown on the MgO(001) substrate besides the majority of in-plane c-axis oriented growth.
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U2 - 10.1093/oxfordjournals.jmicro.a023749
DO - 10.1093/oxfordjournals.jmicro.a023749
M3 - Article
C2 - 10742956
AN - SCOPUS:0033491322
SN - 0022-0744
VL - 48
SP - 785
EP - 789
JO - Journal of Electron Microscopy
JF - Journal of Electron Microscopy
IS - 6
ER -