TY - GEN
T1 - Cell library development methodology for throughput enhancement of electron beam direct-write lithography systems
AU - Sugihara, Makoto
AU - Takata, Taiga
AU - Nakamura, Kenta
AU - Inanami, Ryoichi
AU - Hayashi, Hiroaki
AU - Kishimoto, Katsumi
AU - Hasebe, Tetsuya
AU - Kawano, Yukihiro
AU - Matsunaga, Yusuke
AU - Murakami, Kazuaki
AU - Okumura, Katsuya
PY - 2005
Y1 - 2005
N2 - We propose a cell library development methodology for throughput enhancement of electron beam direct-write (EBDW) systems. First, an ILP (Integer Linear Programming)-based cell selection is proposed for EBDW systems in which both of the character projection (CP) and the variable shaped beam (VSB) methods are available, in order to minimize the number of electron beam (EB) shots, that is, time to fabricate chips. Secondly, the influence of cell directions on area and delay time of chips is examined. The examination helps to reduce the number of EB shots with a little deterioration of area and delay time because unnecessary directions of cells can be removed to increase the number of cells on a CP aperture mask Finally, a case study is shown in which the numbers of EB shots are examined under several cases.
AB - We propose a cell library development methodology for throughput enhancement of electron beam direct-write (EBDW) systems. First, an ILP (Integer Linear Programming)-based cell selection is proposed for EBDW systems in which both of the character projection (CP) and the variable shaped beam (VSB) methods are available, in order to minimize the number of electron beam (EB) shots, that is, time to fabricate chips. Secondly, the influence of cell directions on area and delay time of chips is examined. The examination helps to reduce the number of EB shots with a little deterioration of area and delay time because unnecessary directions of cells can be removed to increase the number of cells on a CP aperture mask Finally, a case study is shown in which the numbers of EB shots are examined under several cases.
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U2 - 10.1109/issoc.2005.1595663
DO - 10.1109/issoc.2005.1595663
M3 - Conference contribution
AN - SCOPUS:33745585482
SN - 0780392949
SN - 9780780392946
T3 - 2005 International Symposium on System-on-Chip, Proceedings
SP - 137
EP - 140
BT - 2005 International Symposium on System-on-Chip, Proceedings
PB - IEEE Computer Society
T2 - 2005 International Symposium on System-on-Chip
Y2 - 15 November 2005 through 17 November 2005
ER -