TY - GEN
T1 - Bonding of LINBO3 thin film on Si substrate using laser irradiation
AU - Kawano, Hiroki
AU - Takigawa, Ryo
AU - Ikenoue, Hiroshi
AU - Asano, Tanemasa
N1 - Publisher Copyright:
© 2015 The Japan Society of Applied Physics.
PY - 2016/2/23
Y1 - 2016/2/23
N2 - Preparation of lithium niobate thin-film on silicon is demonstrated. The process employed is composed of mechanical thinning of the lithium niobate and bonding by using laser irradiation to the face-to-face interface of the two materials. The process is performed in the ambient air while keeping the wafers at room temperature.
AB - Preparation of lithium niobate thin-film on silicon is demonstrated. The process employed is composed of mechanical thinning of the lithium niobate and bonding by using laser irradiation to the face-to-face interface of the two materials. The process is performed in the ambient air while keeping the wafers at room temperature.
UR - https://www.scopus.com/pages/publications/84969567333
UR - https://www.scopus.com/pages/publications/84969567333#tab=citedBy
U2 - 10.1109/MOC.2015.7416527
DO - 10.1109/MOC.2015.7416527
M3 - Conference contribution
AN - SCOPUS:84969567333
T3 - MOC 2015 - Technical Digest of 20th Microoptics Conference
BT - MOC 2015 - Technical Digest of 20th Microoptics Conference
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 20th Microoptics Conference, MOC 2015
Y2 - 25 October 2015 through 28 October 2015
ER -