Beyond Extreme Ultra Violet (BEUV) Radiation from Spherically symmetrical High-Z plasmas

Kensuke Yoshida, Shinsuke Fujioka, Takeshi Higashiguchi, Teruyuki Ugomori, Nozomi Tanaka, Masato Kawasaki, Yuhei Suzuki, Chihiro Suzuki, Kentaro Tomita, Ryouichi Hirose, Takeo Eshima, Hayato Ohashi, Masaharu Nishikino, Enda Scally, Hiroaki Nshimura, Hiroshi Azechi, Gerard O'Sullivan

Research output: Contribution to journalConference articlepeer-review

3 Citations (Scopus)


Photo-lithography is a key technology for volume manufacture of high performance and compact semiconductor devices. Smaller and more complex structures can be fabricated by using shorter wavelength light in the photolithography. One of the most critical issues in development of the next generation photo-lithography is to increase energy conversion efficiency (CE) from laser to shorter wavelength light. Experimental database of beyond extreme ultraviolet (BEUV) radiation was obtained by using spherically symmetrical high-Z plasmas generated with spherically allocated laser beams. Absolute energy and spectra of BEUV light emitted from Tb, Gd, and Mo plasmas were measured with a absolutely calibrated BEUV calorimeter and a transmission grating spectrometer. 1.0 x 1012 W/cm2 is the optimal laser intensity to produced efficient BEUV light source plasmas with Tb and Gd targets. Maximum CE is achieved at 0.8% that is two times higher than the published CEs obtained with planar targets.

Original languageEnglish
Article number012046
JournalJournal of Physics: Conference Series
Issue number1
Publication statusPublished - Apr 1 2016
Event8th International Conference on Inertial Fusion Sciences and Applications, IFSA 2013 - Nara, Japan
Duration: Sept 8 2013Sept 13 2013

All Science Journal Classification (ASJC) codes

  • General Physics and Astronomy


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