Behavior of debris from laser-produced plasma for extreme ultraviolet light source measured by laser imaging technique

Hiroki Tanaka; Yuki Hashimoto; Kouji Tamaru; Akihiko Takahashi; Tatsuo Okada

doi:10.1063/1.2362591

Behavior of debris from laser-produced plasma for extreme ultraviolet light source measured by laser imaging technique

Hiroki Tanaka, Yuki Hashimoto, Kouji Tamaru, Akihiko Takahashi, Tatsuo Okada

Division of medical Quantum Science

Research output: Contribution to journal › Article › peer-review

29 Citations (Scopus)

Abstract

The behavior of debris generated from a laser-produced plasma (LPP) for the extreme ultraviolet light source at 13.5 nm has been studied using a laser induced fluorescence (LIF) imaging system. Tin (Sn) LPPs were produced by irradiating a flat Sn plate and Sn thin films perpendicularly with a Nd:YAG laser beam. When a thin Sn film was used as a target material, the depletion of the Sn atoms was clearly observed along the Nd:YAG laser beam. The LIF system was also used for visualizing the sputtering process of a mirror substrate by the fast ions generated from the plasma.

Original language	English
Article number	181109
Journal	Applied Physics Letters
Volume	89
Issue number	18
DOIs	https://doi.org/10.1063/1.2362591
Publication status	Published - 2006

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.2362591

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title = "Behavior of debris from laser-produced plasma for extreme ultraviolet light source measured by laser imaging technique",

abstract = "The behavior of debris generated from a laser-produced plasma (LPP) for the extreme ultraviolet light source at 13.5 nm has been studied using a laser induced fluorescence (LIF) imaging system. Tin (Sn) LPPs were produced by irradiating a flat Sn plate and Sn thin films perpendicularly with a Nd:YAG laser beam. When a thin Sn film was used as a target material, the depletion of the Sn atoms was clearly observed along the Nd:YAG laser beam. The LIF system was also used for visualizing the sputtering process of a mirror substrate by the fast ions generated from the plasma.",

author = "Hiroki Tanaka and Yuki Hashimoto and Kouji Tamaru and Akihiko Takahashi and Tatsuo Okada",

note = "Funding Information: The authors would like to thank H. Nishimura and his colleagues at The Institute of Laser Engineering, Osaka University for preparing the thin film targets. A part of this work was performed under the auspices of EUVA (Extreme Ultraviolet Lithography System Development Association) and MEXT (Ministry of Education, Culture, Science and Technology, Japan) under the contract subject “Leading project for EUV lithography source development.”",

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AU - Tanaka, Hiroki

AU - Hashimoto, Yuki

AU - Tamaru, Kouji

AU - Takahashi, Akihiko

AU - Okada, Tatsuo

N1 - Funding Information: The authors would like to thank H. Nishimura and his colleagues at The Institute of Laser Engineering, Osaka University for preparing the thin film targets. A part of this work was performed under the auspices of EUVA (Extreme Ultraviolet Lithography System Development Association) and MEXT (Ministry of Education, Culture, Science and Technology, Japan) under the contract subject “Leading project for EUV lithography source development.”

PY - 2006

Y1 - 2006

N2 - The behavior of debris generated from a laser-produced plasma (LPP) for the extreme ultraviolet light source at 13.5 nm has been studied using a laser induced fluorescence (LIF) imaging system. Tin (Sn) LPPs were produced by irradiating a flat Sn plate and Sn thin films perpendicularly with a Nd:YAG laser beam. When a thin Sn film was used as a target material, the depletion of the Sn atoms was clearly observed along the Nd:YAG laser beam. The LIF system was also used for visualizing the sputtering process of a mirror substrate by the fast ions generated from the plasma.

AB - The behavior of debris generated from a laser-produced plasma (LPP) for the extreme ultraviolet light source at 13.5 nm has been studied using a laser induced fluorescence (LIF) imaging system. Tin (Sn) LPPs were produced by irradiating a flat Sn plate and Sn thin films perpendicularly with a Nd:YAG laser beam. When a thin Sn film was used as a target material, the depletion of the Sn atoms was clearly observed along the Nd:YAG laser beam. The LIF system was also used for visualizing the sputtering process of a mirror substrate by the fast ions generated from the plasma.

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Behavior of debris from laser-produced plasma for extreme ultraviolet light source measured by laser imaging technique

Abstract

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