Analysis of plasma for carbon nanotube growth by plasma-enhanced chemical vapor deposition

A. Ozeki, Y. Suda, A. Okita, J. Nakamura, A. Oda, Y. Sakai, H. Sugawara

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Optical emission spectra of a CH4/H2/Ar gas mixture plasma were observed during carbon nanotube (CNT) growth in RF plasma-enhanced chemical vapor deposition. CNTs with diameters of ∼10-30 nm and length of ∼6 (im were grown on double- and triple-layered films of catalyst/support materials (FexOy/TiO2 and Al2O 3/FexOy/Al2O3) at the total gas pressures of 1-10 Torr with gas flow rates of CH4 - 27 seem, H2 = 3 seem, and Ar = 1 seem. The number density of CNTs increased with the gas pressure, and Al2Oy/Fe xOy/Al2O3 (each thickness of 1 nm) film yielded the thinnest CNTs with a high number density among the present catalysts. The spatial distributions of H atom relative density in the plasma were obtained by actinometry. The H relative density decreased with the pressure, and this suggests the suppression of CH3 radical generation in the plasma.

Original languageEnglish
Title of host publicationAssembly at the Nanoscale
Subtitle of host publicationToward Functional Nanostructured Materials
PublisherMaterials Research Society
Pages523-528
Number of pages6
ISBN (Print)1558998551, 9781558998551
DOIs
Publication statusPublished - 2005
Externally publishedYes
Event2005 MRS Fall Meeting - Boston, MA, United States
Duration: Nov 28 2005Dec 2 2005

Publication series

NameMaterials Research Society Symposium Proceedings
Volume901
ISSN (Print)0272-9172

Other

Other2005 MRS Fall Meeting
Country/TerritoryUnited States
CityBoston, MA
Period11/28/0512/2/05

All Science Journal Classification (ASJC) codes

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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