An IrSi oxide film as a highly active water-oxidation catalyst in acidic media

Viet Ha Tran; Takeshi Yatabe; Takahiro Matsumoto; Hidetaka Nakai; Kazuharu Suzuki; Takao Enomoto; Takashi Hibino; Kenji Kaneko; Seiji Ogo

doi:10.1039/c5cc04286k

An IrSi oxide film as a highly active water-oxidation catalyst in acidic media

Viet Ha Tran, Takeshi Yatabe, Takahiro Matsumoto, Hidetaka Nakai, Kazuharu Suzuki, Takao Enomoto, Takashi Hibino, Kenji Kaneko, Seiji Ogo

Research output: Contribution to journal › Article › peer-review

15 Citations (Scopus)

Abstract

We report an acid-stable Si oxide-doped Ir oxide film (IrSi oxide film), made by metal organic chemical vapour deposition (MOCVD) of an Ir^V complex for electrochemical water-oxidation. This is a successful improvement of catalytic ability and stability depending upon the pH of Ir oxide by doping of Si oxide. The turnover frequency (TOF) of the electrochemical water-oxidation by the IrSi oxide film is the highest of any Si oxide-doped Ir oxide materials and higher even than that of Ir oxide in acidic media.

Original language	English
Pages (from-to)	12589-12592
Number of pages	4
Journal	Chemical Communications
Volume	51
Issue number	63
DOIs	https://doi.org/10.1039/c5cc04286k
Publication status	Published - Aug 14 2015

All Science Journal Classification (ASJC) codes

Catalysis
Electronic, Optical and Magnetic Materials
Ceramics and Composites
Chemistry(all)
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1039/c5cc04286k

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title = "An IrSi oxide film as a highly active water-oxidation catalyst in acidic media",

abstract = "We report an acid-stable Si oxide-doped Ir oxide film (IrSi oxide film), made by metal organic chemical vapour deposition (MOCVD) of an IrV complex for electrochemical water-oxidation. This is a successful improvement of catalytic ability and stability depending upon the pH of Ir oxide by doping of Si oxide. The turnover frequency (TOF) of the electrochemical water-oxidation by the IrSi oxide film is the highest of any Si oxide-doped Ir oxide materials and higher even than that of Ir oxide in acidic media.",

author = "Tran, {Viet Ha} and Takeshi Yatabe and Takahiro Matsumoto and Hidetaka Nakai and Kazuharu Suzuki and Takao Enomoto and Takashi Hibino and Kenji Kaneko and Seiji Ogo",

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doi = "10.1039/c5cc04286k",

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T1 - An IrSi oxide film as a highly active water-oxidation catalyst in acidic media

AU - Tran, Viet Ha

AU - Yatabe, Takeshi

AU - Matsumoto, Takahiro

AU - Nakai, Hidetaka

AU - Suzuki, Kazuharu

AU - Enomoto, Takao

AU - Hibino, Takashi

AU - Kaneko, Kenji

AU - Ogo, Seiji

PY - 2015/8/14

Y1 - 2015/8/14

N2 - We report an acid-stable Si oxide-doped Ir oxide film (IrSi oxide film), made by metal organic chemical vapour deposition (MOCVD) of an IrV complex for electrochemical water-oxidation. This is a successful improvement of catalytic ability and stability depending upon the pH of Ir oxide by doping of Si oxide. The turnover frequency (TOF) of the electrochemical water-oxidation by the IrSi oxide film is the highest of any Si oxide-doped Ir oxide materials and higher even than that of Ir oxide in acidic media.

AB - We report an acid-stable Si oxide-doped Ir oxide film (IrSi oxide film), made by metal organic chemical vapour deposition (MOCVD) of an IrV complex for electrochemical water-oxidation. This is a successful improvement of catalytic ability and stability depending upon the pH of Ir oxide by doping of Si oxide. The turnover frequency (TOF) of the electrochemical water-oxidation by the IrSi oxide film is the highest of any Si oxide-doped Ir oxide materials and higher even than that of Ir oxide in acidic media.

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EP - 12592

JO - Chemical Communications

JF - Chemical Communications

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ER -

An IrSi oxide film as a highly active water-oxidation catalyst in acidic media

Abstract

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