All-Nb thin film microbridge-type Josephson junction for submillimeter-wave detection

Nobumitsu Hirose, Yuichi Harada, Matsuo Sekine, Shigeru Yoshimori, Mitsuo Kawamura

Research output: Contribution to journalArticlepeer-review


A copolymer of methyl methacrylate (MMA) and 3-triethoxysilylpropyl methacrylate (ESPMA) was proposed as a positive-working electron beam (EB) resist of a new type. It was found that it had 4-10 times the resistance of polymethylmethacrylate (PMMA) against CBrF3 plasma damage. The mechanism of etching Nb in reactive-ion-etching (RIE) was deciphered. Using the new EB resist and nanometer process technology, an all-Nb thin film microbridge was fabricated. It shows the a.c. Josephson effect, i.e. the Shapiro steps upto the 11th were observed under millimeter-wave (70 GHz) radiation. In addition the coherently working performance of the series array of these thin-film microbridges were observed definitively.

Original languageEnglish
Pages (from-to)445-455
Number of pages11
JournalInfrared Physics
Issue number5
Publication statusPublished - Oct 1993
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Engineering(all)


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