TY - JOUR
T1 - A new positive working alkaline developable photoresist based on a simple amorphous molecule, tri(3,5-di-tert-butoxycarbonyloxybenzyl) 1,3,5-benzenetricarboxylate and a photoacid generator
AU - Fujigaya, Tsuyohiko
AU - Shibasaki, Yuji
AU - Ueda, Mitsuru
PY - 2001
Y1 - 2001
N2 - A simple amorphous molecule, tri(3,5-di-tert-butoxycarbonyloxybenzyl) 1,3,5- benzenetetracarboxylate (4) was prepared from 1,3,5-benzenetricarbonyl trichloride (3) and 3,5-di(tert-butoxycarbonyloxy)benzyl alcohol (2). Compound 4 can form an uniform transparent film by spin-casting on silicone wafer and the film has a good transparency above 300 nm wavelength. The chemically amplified photoresist system based on 4 containing 5 wt% of diphenyliodonium 9,10-dimethoxyanthracene-2-sulfonate (DIAS) showed a sensitivity of 19 mJ/cm2 and a contrast of 17 with 365 nm light.
AB - A simple amorphous molecule, tri(3,5-di-tert-butoxycarbonyloxybenzyl) 1,3,5- benzenetetracarboxylate (4) was prepared from 1,3,5-benzenetricarbonyl trichloride (3) and 3,5-di(tert-butoxycarbonyloxy)benzyl alcohol (2). Compound 4 can form an uniform transparent film by spin-casting on silicone wafer and the film has a good transparency above 300 nm wavelength. The chemically amplified photoresist system based on 4 containing 5 wt% of diphenyliodonium 9,10-dimethoxyanthracene-2-sulfonate (DIAS) showed a sensitivity of 19 mJ/cm2 and a contrast of 17 with 365 nm light.
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U2 - 10.2494/photopolymer.14.275
DO - 10.2494/photopolymer.14.275
M3 - Article
AN - SCOPUS:0035746854
SN - 0914-9244
VL - 14
SP - 275
EP - 280
JO - Journal of Photopolymer Science and Technology
JF - Journal of Photopolymer Science and Technology
IS - 2
ER -