A new anode-electrode structure for sputter deposition of high-quality y-ba-cu-o thin films

Takanobu Kisu; Yuji Ariyoshi; Keiji Enpuku; Keiji Yoshida; Masakatsu Takeo; Kaoru Yamafuji

doi:10.1143/JJAP.28.L1385

A new anode-electrode structure for sputter deposition of high-quality y-ba-cu-o thin films

Takanobu Kisu, Yuji Ariyoshi, Keiji Enpuku, Keiji Yoshida, Masakatsu Takeo, Kaoru Yamafuji

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

A new structure of the anode electrode is presented for sputter deposition of Y-Ba-Cu-O thin films. The present anode electrode is expected to reduce the damage due to charged particles incident on the film surface. Using this method, high-quality films with very smooth surfaces and critical current density as large as j_C(4.2 K)=2.1×10⁷A/cm²can be obtained reproducibly.

Original language	English
Pages (from-to)	L1385-L1388
Journal	Japanese Journal of Applied Physics
Volume	28
Issue number	8 A
DOIs	https://doi.org/10.1143/JJAP.28.L1385
Publication status	Published - Aug 1 1989

All Science Journal Classification (ASJC) codes

Engineering(all)
Physics and Astronomy(all)

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10.1143/JJAP.28.L1385

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@article{8b16ecc3bd834416a579ef068a10d7db,

title = "A new anode-electrode structure for sputter deposition of high-quality y-ba-cu-o thin films",

abstract = "A new structure of the anode electrode is presented for sputter deposition of Y-Ba-Cu-O thin films. The present anode electrode is expected to reduce the damage due to charged particles incident on the film surface. Using this method, high-quality films with very smooth surfaces and critical current density as large as jC(4.2 K)=2.1×107A/cm2can be obtained reproducibly.",

author = "Takanobu Kisu and Yuji Ariyoshi and Keiji Enpuku and Keiji Yoshida and Masakatsu Takeo and Kaoru Yamafuji",

year = "1989",

month = aug,

day = "1",

doi = "10.1143/JJAP.28.L1385",

language = "English",

volume = "28",

pages = "L1385--L1388",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

publisher = "Institute of Physics",

number = "8 A",

}

TY - JOUR

T1 - A new anode-electrode structure for sputter deposition of high-quality y-ba-cu-o thin films

AU - Kisu, Takanobu

AU - Ariyoshi, Yuji

AU - Enpuku, Keiji

AU - Yoshida, Keiji

AU - Takeo, Masakatsu

AU - Yamafuji, Kaoru

PY - 1989/8/1

Y1 - 1989/8/1

N2 - A new structure of the anode electrode is presented for sputter deposition of Y-Ba-Cu-O thin films. The present anode electrode is expected to reduce the damage due to charged particles incident on the film surface. Using this method, high-quality films with very smooth surfaces and critical current density as large as jC(4.2 K)=2.1×107A/cm2can be obtained reproducibly.

AB - A new structure of the anode electrode is presented for sputter deposition of Y-Ba-Cu-O thin films. The present anode electrode is expected to reduce the damage due to charged particles incident on the film surface. Using this method, high-quality films with very smooth surfaces and critical current density as large as jC(4.2 K)=2.1×107A/cm2can be obtained reproducibly.

UR - http://www.scopus.com/inward/record.url?scp=0024718566&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0024718566&partnerID=8YFLogxK

U2 - 10.1143/JJAP.28.L1385

DO - 10.1143/JJAP.28.L1385

M3 - Article

AN - SCOPUS:0024718566

SN - 0021-4922

VL - 28

SP - L1385-L1388

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 8 A

ER -

A new anode-electrode structure for sputter deposition of high-quality y-ba-cu-o thin films

Abstract

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