6.3 eV duv generation based on microchip Nd: YAG laser

Yuji Oki, Takashi Ohe, Hiroaki Yoshioka, Koji Kosaka, Takaaki Kanemaru

Research output: Chapter in Book/Report/Conference proceedingConference contribution


Deep ultraviolet light source using passively Q-switch Nd:YAG laser was proposed and designed for soft laser ablation on scanning electron microscopic application. Design wavelength is from 193 nm to 196.7 nm that exceeds 6.3 eV in photon energy for chemical dissociation of organic sample. Frequency mixing of 4th harmonic beam and optical parametric generated red beam are adopted by using flux-less BBO crystal. Initial design of BBO and PPLN-OPG has been performed.

Original languageEnglish
Title of host publicationLaser Ignition Conference, LIC 2017
PublisherOptica Publishing Group (formerly OSA)
ISBN (Print)9781943580323
Publication statusPublished - 2017
EventLaser Ignition Conference, LIC 2017 - Bucharest, Romania
Duration: Jul 20 2017Jul 23 2017

Publication series

NameOptics InfoBase Conference Papers
VolumePart F67-LIC 2017
ISSN (Electronic)2162-2701


ConferenceLaser Ignition Conference, LIC 2017

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials


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