単結晶Siにおける加工硬化挙動

Translated title of the contribution: Work-hardening in Si single crystals

鈴木 飛翔, 森川 龍哉, 田中 將己, 藤瀬 淳, 小野 敏昭

    Research output: Contribution to journalArticle

    Abstract

    <p>CZ silicon single crystals were deformed in tensile tests along the [1̅34] direction at between 1173 K and 1373. Yield point phenomenon were observed deformed at below 1273 K while continues yield was observed deformed at above 1323 K. Work-hardening rates in stage II were consistent with those reported in other fcc crystals. The onset of stage II was found to have been active before the Schmid factor of the second slip system becomes larger than that of the primary slip system. It supports Takamura's theory that the formation of kink bands contributes to the onset of stage II.</p>
    Translated title of the contributionWork-hardening in Si single crystals
    Original languageJapanese
    Pages (from-to)OS0706
    JournalM&M材料力学カンファレンス
    Volume2019
    Issue number0
    DOIs
    Publication statusPublished - 2019

    Fingerprint

    Dive into the research topics of 'Work-hardening in Si single crystals'. Together they form a unique fingerprint.

    Cite this