Koji Watanabe - Kyushu University Pure Portal Site

Websitehttps://hyoka.ofc.kyushu-u.ac.jp/html/100026170_en.html

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Research activity per year

19 Article
10 Patent
1 Other contribution

Role of bismuth at the interface between bismuth layered ferroelectric thin film and platinum electrode for ferroelectric memory applications
Watanabe, K., Sept 2020
Research output: Other contribution
半導体装置およびその製造方法
Watanabe, K. (Inventor), Jun 2012, Patent No. 5023413, May 11 2001
Research output: Patent
Effect of plasma treatment and dielectric diffusion barrier on electromigration performance of copper damascene interconnects
Takamasa Usui, Hideshi Miyajima, Hideaki Masuda, Kiyotaka Tabuchi, Watanabe, K., Toshiaki Hasegawa & Hideki Shibata, Mar 2006, In: Japanese Journal of Applied Physics. 45, p. 1570-1574
Research output: Contribution to journal › Article › peer-review

26 Link opens in a new tab Citations (Scopus)
Identification of elctromigration dominant diffusion path for Cu damascene interconnects and effect of plasma treatment and barrier dielectrics on electromigration performance
T. Usui, T. Oki, H. Miyajima, K. Tabuchi, Watanabe, K., T. Hasegawa & H. Shibata, 2004, In: 2004 IEEE International Reliability Physics Symposium Proceedings. 42, p. 246-250
Research output: Contribution to journal › Article › peer-review

1 Link opens in a new tab Citation (Scopus)
強誘電体キャパシタの製造方法
Watanabe, K. (Inventor), Miho Sadamoto, Akio Machida & Masahiro Tanaka, Apr 2003, Patent No. 3419974, Nov 14 1995
Research output: Patent

1 Invited talk

ソニーセミコンダクタソリューションズグループのイメージセンサー技術
Watanabe, K. (Speaker)
Jun 2022
Activity: Talk or presentation types › Invited talk