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Dive into the research topics where Kazunari Kurita is active. These topic labels come from the works of this person. Together they form a unique fingerprint.
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Collaborations and top research areas from the last five years
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Fe gettering behavior in proximity gettering silicon epitaxial wafer using SiHx and C2Hy mixture molecular ion implantation
Hirose, R., Onaka-Masada, A., Okuyama, R., Kadono, T., Kobayashi, K., Suzuki, A., Koga, Y. & Kurita, K., Feb 2025, In: Materials Research Society Symposium - Proceedings. 10, 2, p. 202-207 6 p.Research output: Contribution to journal › Article › peer-review
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Impact of Cumulative Pulsed Laser Irradiation on Recrystallization of Amorphized C3H5-Molecular-Ion-Implanted Silicon Substrate Surface
Kobayashi, K., Okuyama, R., Kadono, T., Onaka-Masada, A., Hirose, R., Suzuki, A., Nagatomo, S., Koga, Y. & Kurita, K., 2025, 22nd International Workshop on Junction Technology, IWJT 2025. Institute of Electrical and Electronics Engineers Inc., p. 12-15 4 p. (22nd International Workshop on Junction Technology, IWJT 2025).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
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Metallic Impurity Gettering Behavior of Hydrocarbon-Molecular-Ion-Implanted Epitaxial Silicon Wafer During the pn-Junction Diode Fabrication Process
Nagatomo, S., Kadono, T., Hirose, R., Kobayashi, K., Sasaki, S. & Kurita, K., 2025, In: IEEE Journal of the Electron Devices Society. 13, p. 1282-1287 6 p.Research output: Contribution to journal › Article › peer-review
Open Access -
Metallic Impurity Gettering Behavior of Hydrocarbon-Molecular-Ion-Implanted Epitaxial Silicon Wafer During the Pn-Junction Diode Fabrication Process
Nagatomo, S., Kadono, T., Hirose, R., Kobayashi, K., Sasaki, S. & Kurita, K., 2025, 22nd International Workshop on Junction Technology, IWJT 2025. Institute of Electrical and Electronics Engineers Inc., p. 8-11 4 p. (22nd International Workshop on Junction Technology, IWJT 2025).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
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Novel Production Concept of CH2F-Molecular-Ion Implanted Si Epitaxial Wafer for Highly Sensitive 3D-Stacked CMOS Image Sensors
Hirose, R., Kobayashi, K., Nagatomo, S., Kadono, T. & Kurita, K., 2025, 22nd International Workshop on Junction Technology, IWJT 2025. Institute of Electrical and Electronics Engineers Inc., p. 4-7 4 p. (22nd International Workshop on Junction Technology, IWJT 2025).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution