Chemistry
Liquid Film
75%
Electron Cyclotron Resonance
68%
Sputtering Type
49%
Crystalline Material
49%
Ambient Reaction Temperature
46%
Electron Spin
33%
Flow Kinetics
33%
EPR Spectroscopy
32%
Reaction Temperature
32%
Molecule
32%
Procedure
28%
Carbene
27%
Energy
26%
Triplet Ground State
20%
Microwave
19%
Conformation
19%
Oxidation Reaction
19%
Single Crystalline Solid
18%
Spin Polarization
16%
Dihedral Angle
14%
Ground State
13%
Fourier Transform Infrared Spectroscopy
12%
Dioxygen
12%
Molecular Structure
12%
Argon Ion
12%
Structure
11%
Rate
11%
Refractive Index
10%
Methane
10%
Dimension
10%
Space Group
10%
Ab Initio Calculation
10%
P21
10%
Nitrogen Atom
10%
X-Ray Diffraction
10%
Crystal Structure
10%
Bromine Atom
10%
Surface
10%
Ellipsometry
10%
Cleaning
10%
Spectroscopy
10%
Thickness
9%
Aqueous Solution
9%
Phase Composition
8%
Red
8%
Hydrophobic Surface
8%
Irradiation
8%
Atom
8%
Base
8%
Epitaxial Growth
7%
Physics
Electron Cyclotron Resonance
75%
Substrates
44%
Deposition
41%
Flow Velocity
34%
Temperature
32%
Quality
24%
Microwave
22%
Oxidation
19%
Growth
15%
Photoelectron Spectroscopy
14%
Gas Flow
13%
Oxygen
12%
Atoms
12%
Plasma System
12%
Thin Films
11%
Ellipsometry
10%
Refractivity
10%
Diode
10%
Oxide Film
10%
Growth Rate
10%
Oxynitrides
10%
Cleaning
10%
Silicon
8%
Vacuum
8%
Frequencies
8%
Electrical Properties
7%
Diffusivity
7%
Annealing
7%
Absorption Spectroscopy
7%
Silicon Films
7%
Room Temperature
7%
Oxide
7%
Microstructure
7%
Networks
6%
Increasing
6%
Nitrogen
6%
Amorphous Silicon
6%
Infrared Absorption
6%
Electrical Breakdown
6%
Kinetics
5%
Width
5%
Infrared Spectra
5%
Silicon Dioxide
5%
Ion Irradiation
5%
Pressure
5%
Single Crystals
5%
Heating
5%
Fractions
5%
Defects
5%
Silicon Nitride
5%
Material Science
Liquid Films
100%
Electrical Breakdown
21%
Surface
15%
Characterization
15%
Dielectric Material
12%
Thin Films
11%
Silica Gel
10%
Growth Rate
10%
Adsorption
10%
Silicon Nitride
9%
Temperature
9%
Argon
9%
Irradiation
8%
Structural Property
7%
Microstructure
7%
Amorphous Silicon
6%
Devices
6%
Surface Treatment
5%
Oxidant
5%
Epitaxial Film
5%
Single Crystal
5%
Crystal
5%